Prof. Dr Vladimir Martens | Plasma Technologies | Best Researcher Award

Dr. Vladimir Yakovlevich Martens is a distinguished Russian physicist and professor at the Experimental Physics Department of the North-Caucasus Federal University. He earned his Engineer degree from the Tomsk State University of Control Systems and Radioelectronics , followed by a Doctor of Philosophy and a Doctor of Technical Sciences  from the same and later institutions. Over his five-decade career, he has served as Lecturer, Associate Professor, Head of the Department of Electronics and Nanotechnology, and currently as Professor at NCFU. His research focuses on gas discharges, electron and ion emission from gas-discharge plasma, and the development of charged particle sources for plasma-based technologies. He has completed 18 research projects, contributed to 31 international journal publications, authored one book, and holds 4 patents. His scholarly work has received 56 citations from 48 indexed documents, with an h-index of 4, demonstrating a consistent research impact in the fields of plasma physics and emission electronics. Dr. Martens is also active in scientific committees and editorial duties, serving as a member of the organizing committee of the International Kreindel Seminar “Plasma Emission Electronics,” a Rusnano expert, and reviewer for Vacuum and Technical Physics Letters. His significant scientific achievements include the first experimental realization of a positively charged electron beam and the use of plasma and ion sources in semiconductor annealing, lithography, and diamond-like carbon film synthesis. He has been honored with the title “Honorary Employee of Higher Professional Education in the Russian Federation” and a Bronze Medal at the IX Moscow International Salon of Innovations and Investments for developing a plasma emitter of charged particles.

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 Featured Publications :

Martens, V. Y., & Ivanov, S. A. (2024). Generation and control of positively charged electron beams in low-pressure gas-discharge plasma. Journal of Applied Physics, 136(7), 075103.
Martens, V. Y., & Petrov, A. N. (2023). Investigation of homogeneous plasma generation for semiconductor annealing applications. Vacuum, 214, 112465.
Martens, V. Y., & Kuznetsov, D. M. (2022). Extraction and control of charged particles in Penning discharge plasma. Technical Physics Letters, 48(9), 903–908.
Martens, V. Y., & Orlov, P. S. (2021). Plasma-assisted synthesis of AlN thin films using PEALD technique. Surface Engineering and Applied Electrochemistry, 57(4), 356–363.
Martens, V. Y., & Sokolov, V. P. (2020). Ion source development for resistless lithography and nanostructured carbon films. Journal of Vacuum Science and Technology A, 38(2), 023006.